<HTML><HEAD><TITLE>АННОТАЦИИ
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<TD COLSPAN=2><H2>PAST №3 2000</H2></TD>

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<A HREF="../CONTENTS/CONTENTS_2000_3.html#KEY4" TITLE="АНГЛИЙСКАЯ ВЕРСИЯ">CONTENTS</A></TD>

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<A HREF="../ARTICLE/VANT_2000_3/article_2000_3_159.pdf">ARTICLE</A></TD></TR>

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INDUSTRIAL APPLICATIONS OF TIO2 FILMS DEPOSITED BY ELECTRON-BEAM-EXCITED PLASMA OF METER-SIZE
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Tosin Famakinwa<sup>1</sup>, S. Ikezawa<sup>2</sup>, H.&nbsp;Homyara<sup>2</sup>, T.&nbsp;Yoshioka<sup>2</sup>, K.&nbsp;Nakamura<sup>2</sup>, Y.&nbsp;Ninomiya<sup>2</sup>, H.&nbsp;Oda<sup>3</sup>, T.&nbsp;Hara<sup>4</sup>, M.&nbsp;Hori<sup>5</sup>, S.&nbsp;Fujii<sup>6</sup>, K.&nbsp;Yoshimura<sup>7</sup> and H.&nbsp;Taoda<sup>7</sup> <br>
<sup>1</sup>Kiev Polytech Institute, Ukraine, e-mail: ftosin@hotmail.com <br>
<sup>2</sup>Chubu University, Kasugai, Japan, e-mail: zawa@isc.chubu.ac.jp <br>
<sup>3</sup>Iton Optical Indust. Co. LTD, Japan <br>
<sup>4</sup>Toyta Tech. Institute, Nagoya, Japan <br>
<sup>5</sup>Nagoya University, Japan <br>
<sup>6</sup>Kawasaki Heavy Indust. Ltd., Japan <br>
<sup>7</sup>National Indust. Research Institute of Nagoya, Japan
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UDC 533.9
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